English
- 中文
- English
MCVD disk
Product Name: High-purity Graphite MCVD Deposition Disk (Special for Chemical Vapor Deposition) Abstract
The high-purity graphite MCVD deposition discs are made of isostatic pressure high-purity graphite material. This material is renowned for its high thermal conductivity, excellent thermal stability, and low thermal expansion coefficient. Through precise CNC processing and surface treatment technologies, these deposition discs can achieve extremely high dimensional accuracy and surface flatness, ensuring stable and reliable performance in the chemical vapor deposition (MCVD) process. We are a professional manufacturer of high-purity graphite products, dedicated to providing high-quality MCVD process consumables for high-end manufacturing fields such as optical fiber preforms and semiconductor coating. Our products always maintain high purity and consistency, and can be customized and produced according to the customer's process requirements.
Product Details
The graphite MCVD deposition disc is specially designed for the MCVD (Modified Chemical Vapor Deposition) process. It can withstand high-temperature corrosive environments and maintain dimensional stability during long-term deposition processes. The surface of the deposition disc has been specially treated to effectively reduce particle contamination and film adhesion, thereby improving process repeatability and yield. Its excellent thermal conductivity ensures uniform temperature distribution during the reaction, resulting in high-quality, uniform-thickness deposition layers. This product is suitable for various MCVD reaction furnace models, is easy to install, and has a long maintenance cycle.
Product parameters (specifications)
Manufacturing process
Equipment / Machinery
Materials
Surface treatment
Industry
CNC Precision Machining
CNC machining center, graphite-specific machine, surface grinding machine
Isostatic high-purity graphite (purity ≥ 99.99%)
High-purity coating / Antioxidant treatment
Fiber optic manufacturing, semiconductor coating
Product features and applications (at least one key word in the paragraph, accompanied by product application images)
With the increasing demands for process accuracy and stability in the field of optical fiber communication and semiconductor industry, the quality of the key consumable material for the MCVD process - the graphite deposition disc - directly affects the performance and yield of the optical fiber preform. We focus on producing high-purity, high-precision, and corrosion-resistant graphite MCVD deposition discs with a complete quality control system and advanced graphite processing technology. Our products can significantly enhance the stability and consistency of the deposition process and are widely used in the manufacturing of optical fiber preforms, special glass coating, semiconductor film deposition, and other fields. Advantages
High purity and low pollution
Using graphite raw materials with a purity of over 99.99% and undergoing high-temperature purification treatment, the risk of metal impurities contaminating the process has been significantly reduced.
Excellent thermal stability
The graphite material has an extremely low thermal expansion coefficient and excellent thermal shock resistance, ensuring dimensional stability without cracking or deformation during the high-temperature cycling process of the MCVD technology.
High thermal conductivity and temperature uniformity
The high thermal conductivity ensures rapid temperature response and uniform distribution in the reaction area, which is conducive to the formation of a uniform and dense deposition film layer.
High-precision processing
Through precise CNC processing, the flatness, parallelism and installation hole accuracy of the deposition plate are ensured, achieving a perfect match with the reaction furnace and ensuring long-term reliable operation.
Long service life
Through special surface coating or densification treatment, the oxidation resistance and corrosion resistance have been enhanced, significantly prolonging the service life of the deposition plate in corrosive atmospheres and reducing the overall operating costs. Learn more
The grades of graphite we process:
Material category
Specific model/grade
Main Characteristics
Isostatic high-purity graphite
ISO-88, ISO-63, HPG series
Isotropic, high strength, high purity, fine particles
Molded high-purity graphite
EDM series, MG series
High cost-effectiveness and excellent machinability
Special coating graphite
SiC coating, PyC coating, Al₂O₃ coating
Enhance antioxidant, anti-corrosion and anti-adhesion properties
Surface treatment process:
Category
Handling method
Core Feature
Purification process
High-temperature halogen purification
Deeply remove impurities, with purity reaching ppm or even ppb levels.
Coating process
Chemical Vapor Deposition (CVD) coating
Form a dense protective layer, resistant to corrosion, oxidation, and easy to demold
Polishing process
High-precision mechanical polishing / ultrasonic polishing
Achieve a super-smooth surface (with Ra value reaching 0.2 μm), reduce nucleation points, and facilitate the uniform growth of the film layer.
Dense packing treatment
Resin/ asphalt impregnation and carbonization/graphitization
Increase density and strength, seal the open pores, and improve the anti-permeability.
Key dimension tolerances: ±0.05mm (can be achieved within ±0.02mm upon request)
Surface roughness (Ra): Standard 0.8μm, can provide ultra-smooth surface with ≤0.4μm
Accepted drawing formats: STP, STEP, IGS, XT, AutoCAD (DXF, DWG), PDF or provide samples
Delivery cycle: Standard product 2-3 weeks, custom sample 4-6 weeks
Execution standard: ISO9001:2015, materials comply with ASTM C709 and other relevant standards, can provide third-party material test report
Payment method: Telegraphic Transfer (T/T), Letter of Credit (L/C), Acceptance Draft
Application fields (6 industry pictures, each picture below with large font industry name / small font below level 1)
Fiber preform manufacturing
Used for producing single-mode and multi-mode fiber cores through the MCVD method. Provides stable support and uniform heat field.
Semiconductor film deposition
Used to support wafers in CVD/PECVD equipment. Ensures uniform heating of the wafers at high temperatures and prevents deformation.
Compound semiconductor epitaxy
Used in MOCVD reaction chambers. As a substrate tray or heater component, it requires high purity and high temperature resistance.
Special glass and crystal growth
Used to support crucibles in high-temperature furnaces or as heating elements. It has excellent chemical inertness.
Research and Laboratory CVD System
Small customized CVD equipment for universities and research institutes. Supports non-standard design and rapid prototyping.
Photovoltaics and New Energy Materials
Deposition processes for thin-film solar cells, lithium battery materials, etc. Provide a reliable process platform. Frequently Asked Questions Answered
Q1: What are the main performance indicators of the graphite MCVD deposition disc?
A1: The key indicators include: graphite purity (typically ≥ 99.99%), ash content, volume density, compressive strength, thermal expansion coefficient, thermal conductivity, as well as the dimensional accuracy and surface roughness after processing. These indicators collectively determine its stability in high-temperature corrosive environments, service life, and its impact on the quality of the deposited film layer.
Q2: How long does the service life of the deposition disc last? How can it be extended?
A2: The service life depends on specific process conditions (temperature, atmosphere, corrosiveness, etc.), usually ranging from several to several dozen process cycles. To extend its lifespan, it is recommended to: 1) Choose the coating type suitable for the process atmosphere (such as SiC coating for strong oxidation environment); 2) Follow the correct installation, usage and cooling procedures; 3) Regularly perform surface cleaning and maintenance to avoid mechanical damage.
Q3: Do you support complete customization based on our reactor design drawings?
A3: Yes, we offer comprehensive customization services. You can provide detailed reactor interface drawings, process temperature curves, and atmosphere requirements. Based on this information, we will select materials, design the structure, and carry out precision processing to ensure that the deposition plate is perfectly matched with your equipment and optimizes the process performance.
Copy product links
Long by picture save/share
INQUIRY
Add Successfully
INQUIRY
Add Successfully
SIMO (TIANJIN) TECHNOLOGY CO., LTD.
Telephone: 136-4212-5292
Q Q:2767728703
Postal Code: 300350
Email: smkj889@163.com
思摩（天津)科技有限公司
电话:13642125292
传真:022-8861-6121
Q Q:2767728703
邮编:300350
邮箱:smkj889@163.com
点击右上角
分享给朋友吧
思摩（天津)科技有限公司 版权所有| 粤ICP备00000000号
Copyright © Simo (Tianjin) Technology Co., Ltd.
